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Inline TCO Coating Equipment (Magnetron Sputter,PVD)
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Inline TCO Coating Equipment (Magnetron Sputter,PVD)
Coating Principle
·Magnetron Sputter (PVD).
Features
·Multiple cathode operation for seed layer and multiple refractive index tandem TCO.
Compatible Wafer Size
·M10, M12/G12, Full / Half Cell.
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In-line PECVD
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