产品中心 / PRODUCT
T-ALD/Spacial ALD Equipment
T-ALD/Spacial ALD Equipment
Features
·Time-based ALD, Low-temperature film deposition, Controllable film thickness accuracy.
·The coating has good density without pores, with excellent step coverage.
·Applied in industries such as crystalline silicon batteries, perovskite, HJT, HBC, and microelectronic device manufacturing.
|
COPYRIGHT ? 2018-2020. S.C New Energy Technology Corporation,All Rights Reserved
粤ICP备05146584号-1
三五互联
TOP